Heterogeneous Photonic Integration by Direct Wafer Bonding
نویسندگان
چکیده
The silicon (Si) photonics platform has emerged as a promising integration platform for use in many applications, particularly datacenter communications, which is expected to produce demand for large numbers of low cost photonic integrated circuits (PICs). Sibased PICs are almost universally based on Si-on-insulator (SOI) wafers, which are enabled by wafer bonding technology. Si is useful as a waveguide material due to its high index contrast, low intrinsic absorption, and mature manufacturing technology. However, it does not strongly absorb or emit light in wavelength ranges of interest for data transmission. Heterogeneous integration of InP-based materials with Si using wafer bonding technology is able to overcome this limitation and has allowed the realization of a wide range of photonic devices on Si, including lasers, photodetectors, and modulators with high performance (1).
منابع مشابه
Room-Temperature Bonding of Wafers with Smooth Au Thin Films in Ambient Air Using a Surface-Activated Bonding Method
Wafers with smooth Au thin films (rms surface roughness: < 0.5 nm, thickness: < 50 nm) were successfully bonded in ambient air at room temperature after an Ar radio frequency plasma activation process. The room temperature bonded glass wafers without any heat treatment showed a sufficiently high die-shear strength of 47–70MPa. Transmission electron microscopy observations showed that direct bon...
متن کاملHeterogenous integration of InP/InGaAsP photodetectors onto ultracompact Silicon-on-Insulator waveguide circuits
We present the heterogeneous integration of InP/InGaAsP photodetectors onto ultracompact Silicon-onInsulator (SOI) waveguide circuits using benzocyclobutene (BCB) die to wafer bonding. This technology development enables the integration of a photonic interconnection layer on top of CMOS. Fabrication processes were optimized and the transfer of a passive Silicon-on-Insulator waveguide layer usin...
متن کاملWafer Level AlGe Eutectic Bonding for MEMS-Electronic-Photonic Heterogeneous Integration
An AlGe eutectic wafer level bonding process is presented and characterized for heterogeneous integration of silicon photonics, CMOS integrated electronic circuits and active III-V components. Heterogeneous Integration of Photonics and CMOS The technology of silicon photonics integrated circuits (SiPIC) currently finds itself transitioning from research to industrial scale production [1]. The p...
متن کاملLow Temperature Wafer Bonding for III-V Si Photonic Integrated Circuits
VLSI Photonics is an important research direction that is driven by the need for increasing circuit complexity and chip functionality as well as lower cost photonic integrated circuits. Recently, lasers, amplifiers and photodetectors have been demonstrated using evanescent coupling from Si optical waveguides to III-V materials. A key problem is to develop a low temperature bonding process betwe...
متن کاملOxide-Oxide Thermocompression Direct Bonding Technologies with Capillary Self-Assembly for Multichip-to-Wafer Heterogeneous 3D System Integration
Plasmaand water-assisted oxide-oxide thermocompression direct bonding for a self-assembly based multichip-to-wafer (MCtW) 3D integration approach was demonstrated. The bonding yields and bonding strengths of the self-assembled chips obtained by the MCtW direct bonding technology were evaluated. In this study, chemical mechanical polish (CMP)-treated oxide formed by plasma-enhanced chemical vapo...
متن کامل